Use of a novel Chinchilla skull base repair model to test a photo-initiated thiol-ene biopolymer

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dc.contributor.authorTerella, Adam M.
dc.contributor.authorMariner, Peter
dc.contributor.authorCool, Carlyne D.
dc.contributor.authorRamakrishnan, Vijay R.
dc.contributor.departmentOtolaryngology -- Head and Neck Surgery, School of Medicineen_US
dc.date.accessioned2022-05-12T19:19:00Z
dc.date.available2022-05-12T19:19:00Z
dc.date.issued2022
dc.eprint.versionAuthor's manuscripten_US
dc.identifier.citationTerella, A. M., Mariner, P., Cool, C. D., & Ramakrishnan, V. R. (2022). Use of a novel Chinchilla skull base repair model to test a photo-initiated thiol-ene biopolymer. International Forum of Allergy & Rhinology. https://doi.org/10.1002/alr.23004en_US
dc.identifier.issn2042-6984en_US
dc.identifier.urihttps://hdl.handle.net/1805/28976
dc.language.isoenen_US
dc.publisherWileyen_US
dc.relation.isversionof10.1002/alr.23004en_US
dc.relation.journalInternational Forum of Allergy & Rhinologyen_US
dc.rightsPublisher Policyen_US
dc.sourceAuthoren_US
dc.subjectBiomaterialsen_US
dc.subjectChinchillaen_US
dc.subjectCSF leak repairen_US
dc.titleUse of a novel Chinchilla skull base repair model to test a photo-initiated thiol-ene biopolymeren_US
dc.typeArticleen_US
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