High Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithography

dc.contributor.advisorRyu, Jong Eun
dc.contributor.authorKim, Jeonghwan
dc.contributor.otherZhu, Likun
dc.contributor.otherAgarwal, Mangilal
dc.contributor.otherAnwar, Sohel
dc.date.accessioned2016-09-14T19:03:52Z
dc.date.available2016-09-14T19:03:52Z
dc.date.issued2016
dc.degree.date2016en_US
dc.degree.disciplineMechanical Engineeringen
dc.degree.grantorPurdue Universityen_US
dc.degree.levelM.S.M.E.en_US
dc.descriptionIndiana University-Purdue University Indianapolis (IUPUI)en_US
dc.description.abstractInfrared (IR) polarizers have been widely used in military and commercial applications. Controlling the polarization of incident light is one of major issues in the detector systems. However, conventional polarimetric IR detectors require series of polarizers and optical components, which increase the volume and weight of the system. In this research, stacked 1-dimensional (1-D) subwavelength grating structures were studied to develop compact size IR polarimetric detector by using surface plasmonic polariton. Experimental parameters were optimized by Finite Difference Time Domain (FDTD) simulation. Effects of gold (Au) grating size, numbers of stacked gratings, and dielectric space height were tested in the FDTD study. The fabrication of grating layers was conducted by using nanoimprint lithography. The samples were characterized by scanning electron microscopy. IR transmissions in transverse magnetic (TM) and transverse electric (TE) modes were measured by Fourier transform infrared spectroscopy (FTIR).en_US
dc.identifier.doi10.7912/C2F888
dc.identifier.urihttps://hdl.handle.net/1805/10920
dc.identifier.urihttp://dx.doi.org/10.7912/C2/2628
dc.language.isoen_USen_US
dc.subjectSubwavelengthen_US
dc.subjectPolarizeren_US
dc.subjectInfrareden_US
dc.subjectNanoimprint Lithographyen_US
dc.titleHigh Extinction Ratio Subwavelength 1D Infrared Polarizer by Nanoimprint Lithographyen_US
dc.typeThesisen
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