Becerra-Mora, NathalieVargas-Lizarazo, Annie Y.Orrison, ConnorBarron, MonicaBalaraman, Rajesh P.Kohli, Punit2019-05-162019-05-162019Becerra-Mora, N., Vargas-Lizarazo, A. Y., Orrison, C., Barron, M., Balaraman, R. P., & Kohli, P. (2019). Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices. ACS Applied Electronic Materials. https://doi.org/10.1021/acsaelm.9b00099https://hdl.handle.net/1805/19343Electrochemical erasing of conductive coatings at microscale for the fabrication of functional devices on flexible and hard surfaces is demonstrated. The nanoporous pyramidal-shaped nano- and microscale polyacrylamide hydrogel PLE probes allowed delivery of electrochemical etchants to the surface, providing on-demand maskless patterning at microscale. Highly efficient erasing (silver and copper metals erasing efficiency ≈ 100%), areal erasing rate ≈ 80 μm2/s, and pressure dependent spatial erasing feature dimensions between 3 μm to many tens of microns on metal surfaces allowed for the fabrication of microelectrodes of various geometries. Overall, PLE-based microscale erasing allowed for rapid and accessible fabrication of organic electron–hole carrier pair-based microphotodetector, as well as the assembly of LED on flexible and rigid ITO substrates.enPublisher Policydevice fabricationelectrochemical etchinghydrogelArticle